Procesos hopping a través del modelo difusional en materiales nanocristalinos usados para aplicaciones fotovoltaicas

Procesos hopping a través del modelo difusional en materiales nanocristalinos usados para aplicaciones fotovoltaicas

Here, we present variable range hopping (VRH) models, nearest neighbor hopping (NNH) and potential barriers present at the grain boundaries, as well as mechanisms of electrical transport predominant in semiconductor materials for photovoltaic applications. We performed dark conductivity measures acc...

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Journal Title: Universitas Scientiarum
First author: A. Dussan
Other Authors: F. Mesa
Language: English
Get full text: https://revistas.javeriana.edu.co/index.php/scientarium/article/view/8389
Resource type: Journal Article
Source: Universitas Scientiarum; Vol 19, No 2 (Year 2014).
DOI: http://dx.doi.org/10.11144/javeriana.SC19-2.phmd
Publisher: Pontificia Universidad Javeriana
Usage rights: Reconocimiento (by)
Categories: Life Sciences --> Biology
Physical/Engineering Sciences --> Mathematics
Physical/Engineering Sciences --> Physics, Multidisciplinary
Abstract: Here, we present variable range hopping (VRH) models, nearest neighbor hopping (NNH) and potential barriers present at the grain boundaries, as well as mechanisms of electrical transport predominant in semiconductor materials for photovoltaic applications. We performed dark conductivity measures according to temperature for low temperature regions between 120 and 400 K in Si and Cu3BiS2 and Cu2ZnSnSe4 compounds. Using the percolation theory, we obtained hopping parameters and the density of states near the Fermi, N(EF) level for all samples. Using the approach by Mott for VRH, we obtained the diffusion model, which established the relationship between conductivity and density of defect states or localized gap states of the material. The comparative analysis between models evidenced that it is possible to obtain improvement of an order of magnitude in the values of each of the hopping parameters that characterize the material.